Photo resist
Etching
Doping impurities
None of the mentioned
Answer is Wrong!
Answer is Right!
The correct answer is C. Doping impurities.
Doping is the process of adding impurities to a semiconductor material to change its electrical properties. In the case of polysilicon, doping with boron or phosphorus atoms can reduce its resistivity.
Photo resist is a light-sensitive material that is used in photolithography to create patterns on a semiconductor wafer. Etching is a process that
uses chemicals to remove material from a semiconductor wafer.Neither photo
resist nor etching are used to reduce the resistivity of polysilicon.