[amp_mcq option1=”Silver Nitride” option2=”Silicon Nitride” option3=”Hydrofluoric acid” option4=”Polysilicon” correct=”option2″]<\/p>\n
The correct answer is B. Silicon Nitride.<\/p>\n
Silicon nitride (Si3N4) is a ceramic material that is used as a dielectric in semiconductor devices. It is also used as a barrier layer to protect the active areas of a semiconductor device from etching or oxidation.<\/p>\n
Silver nitride (Ag3N) is a white, crystalline solid that is used as a catalyst and in the production of silver metal. It is also used as a semiconductor material.<\/p>\n
Hydrofluoric acid (HF) is a strong acid that is used to etch silicon and other materials. It is also used in the production of aluminum and other metals.<\/p>\n
Polysilicon (Si) is a semiconductor material that is used in the fabrication of integrated circuits. It is also used in solar cells and other applications.<\/p>\n
In the process of selective oxide growth, a chemical is used to shield the active areas of a semiconductor device from etching or oxidation. This allows the oxide to grow only in the desired areas. Silicon nitride is the most common chemical used for this purpose. It is a very effective barrier layer that can withstand the high temperatures and chemicals used in the fabrication process.<\/p>\n","protected":false},"excerpt":{"rendered":"
[amp_mcq option1=”Silver Nitride” option2=”Silicon Nitride” option3=”Hydrofluoric acid” option4=”Polysilicon” correct=”option2″]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[687],"tags":[],"class_list":["post-19832","post","type-post","status-publish","format-standard","hentry","category-vlsi-design-and-testing","no-featured-image-padding"],"yoast_head":"\n