{"id":19763,"date":"2024-04-15T05:43:46","date_gmt":"2024-04-15T05:43:46","guid":{"rendered":"https:\/\/exam.pscnotes.com\/mcq\/?p=19763"},"modified":"2024-04-15T05:43:46","modified_gmt":"2024-04-15T05:43:46","slug":"in-cmos-fabrication-the-photoresist-layer-is-exposed-to-a-visible-light-b-ultraviolet-light-c-infra-red-light-d-fluorescent","status":"publish","type":"post","link":"https:\/\/exam.pscnotes.com\/mcq\/in-cmos-fabrication-the-photoresist-layer-is-exposed-to-a-visible-light-b-ultraviolet-light-c-infra-red-light-d-fluorescent\/","title":{"rendered":"In CMOS fabrication, the photoresist layer is exposed to . . . . . . . . A. Visible light B. Ultraviolet light C. Infra red light D. Fluorescent"},"content":{"rendered":"

[amp_mcq option1=”Visible light” option2=”Ultraviolet light” option3=”Infra red light” option4=”Fluorescent” correct=”option2″]<\/p>\n

The correct answer is B. Ultraviolet light.<\/p>\n

Photoresist is a light-sensitive material that is used in the fabrication of integrated circuits. It is applied to a wafer, which is then exposed to ultraviolet light through a mask. The areas of the photoresist that are exposed to the light are then developed, leaving a pattern of exposed and unexposed areas. The exposed areas are then etched away, leaving behind the desired pattern of features on the wafer.<\/p>\n

Visible light is not energetic enough to cause photoresist to react. Infra red light is too long of a wavelength to be absorbed by photoresist. Fluorescent light is a type of visible light, so it would not be able to expose the photoresist either.<\/p>\n

Ultraviolet light is the only type of light that is energetic enough to cause photoresist to react. This is why it is used in the fabrication of integrated circuits.<\/p>\n","protected":false},"excerpt":{"rendered":"

[amp_mcq option1=”Visible light” option2=”Ultraviolet light” option3=”Infra red light” option4=”Fluorescent” correct=”option2″]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[687],"tags":[],"class_list":["post-19763","post","type-post","status-publish","format-standard","hentry","category-vlsi-design-and-testing","no-featured-image-padding"],"yoast_head":"\nIn CMOS fabrication, the photoresist layer is exposed to . . . . . . . . A. Visible light B. Ultraviolet light C. Infra red light D. 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