[amp_mcq option1=”High sensitive polymer” option2=”Light sensitive polymer” option3=”Polysilicon” option4=”Silicon di oxide” correct=”option1″]
The correct answer is: A. High sensitive polymer.
A photoresist is a light-sensitive material that is used in the photolithography process to create patterns on a semiconductor wafer. The photoresist is applied to the wafer in a thin layer, and then exposed to ultraviolet light through a mask. The areas of the photoresist that are exposed to light are then chemically developed, leaving behind a pattern of exposed and unexposed areas. The unexposed areas of the photoresist are then etched away, leaving behind the desired pattern on the wafer.
High-sensitive polymers are used in photolithography because they are more sensitive to light than other types of polymers. This means that they can be exposed to shorter wavelengths of light, which allows for smaller patterns to be created. High-sensitive polymers are also more resistant to etching, which means that they can be used to create patterns with finer details.
The other options are incorrect because they are not light-sensitive materials. Polysilicon is a type of silicon that is used in the fabrication of integrated circuits. Silicon dioxide is a type of oxide that is used as a passivation layer on semiconductor devices.