Latch-up can be induced by . . . . . . . . A. Incident radiation B. Reflected radiation C. Etching D. Diffracted radiation

Incident radiation
Reflected radiation
Etching
Diffracted radiation

The correct answer is A. Incident radiation.

Latch-up is a condition in which a semiconductor device can become unstable and continue to conduct current even after the triggering event has been removed. This can cause the device to overheat and fail.

Incident radiation is radiation that strikes a surface. This can include light, heat, and other forms of energy. When incident radiation strikes a semiconductor device, it can cause electrons to be knocked loose from their atoms. These free electrons can then move through the device, causing it to conduct current.

If the amount of incident radiation is high enough, it can cause latch-up. This is because the free electrons can cause a chain reaction, with each electron knocking loose more electrons. This can create a runaway condition in which the device continues to conduct current even after the triggering event has been removed.

B. Reflected radiation is radiation that bounces off a surface. This can also cause electrons to be knocked loose from their atoms, but it is less likely to cause latch-up than incident radiation.

C. Etching is a process that removes material from a surface. This can also cause electrons to be knocked loose from their atoms, but it is less likely to cause latch-up than incident radiation.

D. Diffracted radiation is radiation that is scattered in different directions after passing through a narrow opening. This is also less likely to cause latch-up than incident radiation.

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