The correct answer is False.
CMOS fabrication is a process of manufacturing integrated circuits (ICs) using complementary metal-oxide-semiconductor (CMOS) technology. CMOS technology uses both n-type and p-type MOSFETs (metal-oxide-semiconductor field-effect transistors) to create logic gates and other circuit elements. The n-type and p-type MOSFETs are integrated in separate regions of the substrate, which is a semiconductor material such as silicon.
The main advantage of CMOS technology is that it is very energy-efficient. This is because n-type and p-type MOSFETs are complementary to each other, meaning that they switch on and off in opposite ways. When one type of MOSFET is turned on, the other type is turned off. This means that there is no current flowing through the circuit when it is not in use.
CMOS technology is also very scalable, meaning that it can be used to create ICs with a large number of transistors. This makes it ideal for use in high-performance processors and memory chips.
In conclusion, the correct answer to the question “In CMOS fabrication, nMOS and pMOS are integrated in same substrate” is False.